Ultrafast Infrared Laser Crystallization of Amorphous Ge Films on Glass Substrates

Amorphous germanium films on nonrefractory glass substrates were annealed by ultrashort near-infrared (1030 nm, 1.4 ps) and mid-infrared (1500 nm, 70 fs) laser pulses. Crystallization of germanium irradiated at a laser energy density (fluence) range from 25 to 400 mJ/cm(2) under single-shot and mult...

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Detalles Bibliográficos
Autores principales: Cheng, Yuzhu, Bulgakov, Alexander V., Bulgakova, Nadezhda M., Beránek, Jiří, Zukerstein, Martin, Milekhin, Ilya A., Popov, Alexander A., Volodin, Vladimir A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10673445/
https://www.ncbi.nlm.nih.gov/pubmed/38004906
http://dx.doi.org/10.3390/mi14112048

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10673445/
https://www.ncbi.nlm.nih.gov/pubmed/38004906
http://dx.doi.org/10.3390/mi14112048

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