Cargando…
Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation
Memristors, resistive switching memory devices, play a crucial role in the energy-efficient implementation of artificial intelligence. This study investigates resistive switching behavior in a lateral 2D composite structure composed of bilayer graphene and 2D diamond (diamane) nanostructures formed...
Autores principales: | , , , , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10674167/ https://www.ncbi.nlm.nih.gov/pubmed/37999332 http://dx.doi.org/10.3390/nano13222978 |
_version_ | 1785149679343763456 |
---|---|
author | Emelin, Evgeny V. Cho, Hak Dong Korepanov, Vitaly I. Varlamova, Liubov A. Klimchuk, Darya O. Erohin, Sergey V. Larionov, Konstantin V. Kim, Deuk Young Sorokin, Pavel B. Panin, Gennady N. |
author_facet | Emelin, Evgeny V. Cho, Hak Dong Korepanov, Vitaly I. Varlamova, Liubov A. Klimchuk, Darya O. Erohin, Sergey V. Larionov, Konstantin V. Kim, Deuk Young Sorokin, Pavel B. Panin, Gennady N. |
author_sort | Emelin, Evgeny V. |
collection | PubMed |
description | Memristors, resistive switching memory devices, play a crucial role in the energy-efficient implementation of artificial intelligence. This study investigates resistive switching behavior in a lateral 2D composite structure composed of bilayer graphene and 2D diamond (diamane) nanostructures formed using electron beam irradiation. The resulting bigraphene/diamane structure exhibits nonlinear charge carrier transport behavior and a significant increase in resistance. It is shown that the resistive switching of the nanostructure is well controlled using bias voltage. The impact of an electrical field on the bonding of diamane-stabilizing functional groups is investigated. By subjecting the lateral bigraphene/diamane/bigraphene nanostructure to a sufficiently strong electric field, the migration of hydrogen ions and/or oxygen-related groups located on one or both sides of the nanostructure can occur. This process leads to the disruption of sp(3) carbon bonds, restoring the high conductivity of bigraphene. |
format | Online Article Text |
id | pubmed-10674167 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-106741672023-11-20 Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation Emelin, Evgeny V. Cho, Hak Dong Korepanov, Vitaly I. Varlamova, Liubov A. Klimchuk, Darya O. Erohin, Sergey V. Larionov, Konstantin V. Kim, Deuk Young Sorokin, Pavel B. Panin, Gennady N. Nanomaterials (Basel) Article Memristors, resistive switching memory devices, play a crucial role in the energy-efficient implementation of artificial intelligence. This study investigates resistive switching behavior in a lateral 2D composite structure composed of bilayer graphene and 2D diamond (diamane) nanostructures formed using electron beam irradiation. The resulting bigraphene/diamane structure exhibits nonlinear charge carrier transport behavior and a significant increase in resistance. It is shown that the resistive switching of the nanostructure is well controlled using bias voltage. The impact of an electrical field on the bonding of diamane-stabilizing functional groups is investigated. By subjecting the lateral bigraphene/diamane/bigraphene nanostructure to a sufficiently strong electric field, the migration of hydrogen ions and/or oxygen-related groups located on one or both sides of the nanostructure can occur. This process leads to the disruption of sp(3) carbon bonds, restoring the high conductivity of bigraphene. MDPI 2023-11-20 /pmc/articles/PMC10674167/ /pubmed/37999332 http://dx.doi.org/10.3390/nano13222978 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Emelin, Evgeny V. Cho, Hak Dong Korepanov, Vitaly I. Varlamova, Liubov A. Klimchuk, Darya O. Erohin, Sergey V. Larionov, Konstantin V. Kim, Deuk Young Sorokin, Pavel B. Panin, Gennady N. Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation |
title | Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation |
title_full | Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation |
title_fullStr | Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation |
title_full_unstemmed | Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation |
title_short | Resistive Switching in Bigraphene/Diamane Nanostructures Formed on a La(3)Ga(5)SiO(14) Substrate Using Electron Beam Irradiation |
title_sort | resistive switching in bigraphene/diamane nanostructures formed on a la(3)ga(5)sio(14) substrate using electron beam irradiation |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10674167/ https://www.ncbi.nlm.nih.gov/pubmed/37999332 http://dx.doi.org/10.3390/nano13222978 |
work_keys_str_mv | AT emelinevgenyv resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT chohakdong resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT korepanovvitalyi resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT varlamovaliubova resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT klimchukdaryao resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT erohinsergeyv resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT larionovkonstantinv resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT kimdeukyoung resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT sorokinpavelb resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation AT paningennadyn resistiveswitchinginbigraphenediamanenanostructuresformedonala3ga5sio14substrateusingelectronbeamirradiation |