Cargando…
Nucleation and Growth of GaAs on a Carbon Release Layer by Halide Vapor Phase Epitaxy
[Image: see text] We couple halide vapor phase epitaxy (HVPE) growth of III–V materials with liftoff from an ultrathin carbon release layer to address two significant cost components in III–V device - epitaxial growth and substrate reusability. We investigate nucleation and growth of GaAs layers by...
Autores principales: | Roberts, Dennice M., Kim, Hyunseok, McClure, Elisabeth L., Lu, Kuangye, Mangum, John S., Braun, Anna K., Ptak, Aaron J., Schulte, Kevin L., Kim, Jeehwan, Simon, John |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2023
|
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10688164/ https://www.ncbi.nlm.nih.gov/pubmed/38046304 http://dx.doi.org/10.1021/acsomega.3c07162 |
Ejemplares similares
-
Consideration of the Intricacies Inherent in Molecular
Beam Epitaxy of the NaCl/GaAs System
por: May, Brelon J., et al.
Publicado: (2022) -
The X-ray response of epitaxial GaAs
por: Owens, A, et al.
Publicado: (1998) -
Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy
por: Li, Ming-Yu, et al.
Publicado: (2012) -
Temperature Activated Dimensionality Crossover in the Nucleation of Quantum Dots by Droplet Epitaxy on GaAs(111)A Vicinal Substrates
por: Tuktamyshev, Artur, et al.
Publicado: (2019) -
Revealing the Significance of Catalytic and Alkyl
Exchange Reactions during GaAs and GaP Growth by Metal Organic Vapor
Phase Epitaxy
por: Maßmeyer, Oliver, et al.
Publicado: (2021)