Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images

[Image: see text] Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is used across many fields for the atomic and molecular characterization of surfaces, with both high sensitivity and high spatial resolution. When large analysis areas are required, standard ToF-SIMS instruments allo...

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Detalles Bibliográficos
Autores principales: Kandanaarachchi, Sevvandi, Gardner, Wil, Alexander, David L. J., Muir, Benjamin W., Chouinard, Philippe A., Crewther, Sheila G., Scurr, David J., Halliday, Mark, Pigram, Paul J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10688221/
https://www.ncbi.nlm.nih.gov/pubmed/37963228
http://dx.doi.org/10.1021/acs.analchem.3c03887

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10688221/
https://www.ncbi.nlm.nih.gov/pubmed/37963228
http://dx.doi.org/10.1021/acs.analchem.3c03887

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