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Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images

[Image: see text] Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is used across many fields for the atomic and molecular characterization of surfaces, with both high sensitivity and high spatial resolution. When large analysis areas are required, standard ToF-SIMS instruments allo...

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Autores principales: Kandanaarachchi, Sevvandi, Gardner, Wil, Alexander, David L. J., Muir, Benjamin W., Chouinard, Philippe A., Crewther, Sheila G., Scurr, David J., Halliday, Mark, Pigram, Paul J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10688221/
https://www.ncbi.nlm.nih.gov/pubmed/37963228
http://dx.doi.org/10.1021/acs.analchem.3c03887
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author Kandanaarachchi, Sevvandi
Gardner, Wil
Alexander, David L. J.
Muir, Benjamin W.
Chouinard, Philippe A.
Crewther, Sheila G.
Scurr, David J.
Halliday, Mark
Pigram, Paul J.
author_facet Kandanaarachchi, Sevvandi
Gardner, Wil
Alexander, David L. J.
Muir, Benjamin W.
Chouinard, Philippe A.
Crewther, Sheila G.
Scurr, David J.
Halliday, Mark
Pigram, Paul J.
author_sort Kandanaarachchi, Sevvandi
collection PubMed
description [Image: see text] Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is used across many fields for the atomic and molecular characterization of surfaces, with both high sensitivity and high spatial resolution. When large analysis areas are required, standard ToF-SIMS instruments allow for the acquisition of adjoining tiles, which are acquired by rastering the primary ion beam. For such large area scans, tiling artifacts are a ubiquitous challenge, manifesting as intensity gradients across each tile and/or sudden changes in intensity between tiles. Such artifacts are thought to be related to a combination of sample charging, local detector sensitivity issues, and misalignment of the primary ion gun, among other instrumental factors. In this work, we investigated six different computational tiling artifact removal methods: tensor decomposition, multiplicative linear correction, linear discriminant analysis, seamless stitching, simple averaging, and simple interpolating. To ensure robustness in the study, we applied these methods to three hyperspectral ToF-SIMS data sets and one OrbiTrapSIMS data set. Our study includes a carefully designed statistical analysis and a quantitative survey that subjectively assessed the quality of the various methods employed. Our results demonstrate that while certain methods are useful and preferred more often, no one particular approach can be considered universally acceptable and that the effectiveness of the artifact removal method is strongly dependent on the particulars of the data set analyzed. As examples, the multiplicative linear correction and seamless stitching methods tended to score more highly on the subjective survey; however, for some data sets, this led to the introduction of new artifacts. In contrast, simple averaging and interpolation methods scored subjectively poorly on the biological data set, but more highly on the microarray data sets. We discuss and explore these findings in depth and present general recommendations given our findings to conclude the work.
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spelling pubmed-106882212023-12-01 Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images Kandanaarachchi, Sevvandi Gardner, Wil Alexander, David L. J. Muir, Benjamin W. Chouinard, Philippe A. Crewther, Sheila G. Scurr, David J. Halliday, Mark Pigram, Paul J. Anal Chem [Image: see text] Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is used across many fields for the atomic and molecular characterization of surfaces, with both high sensitivity and high spatial resolution. When large analysis areas are required, standard ToF-SIMS instruments allow for the acquisition of adjoining tiles, which are acquired by rastering the primary ion beam. For such large area scans, tiling artifacts are a ubiquitous challenge, manifesting as intensity gradients across each tile and/or sudden changes in intensity between tiles. Such artifacts are thought to be related to a combination of sample charging, local detector sensitivity issues, and misalignment of the primary ion gun, among other instrumental factors. In this work, we investigated six different computational tiling artifact removal methods: tensor decomposition, multiplicative linear correction, linear discriminant analysis, seamless stitching, simple averaging, and simple interpolating. To ensure robustness in the study, we applied these methods to three hyperspectral ToF-SIMS data sets and one OrbiTrapSIMS data set. Our study includes a carefully designed statistical analysis and a quantitative survey that subjectively assessed the quality of the various methods employed. Our results demonstrate that while certain methods are useful and preferred more often, no one particular approach can be considered universally acceptable and that the effectiveness of the artifact removal method is strongly dependent on the particulars of the data set analyzed. As examples, the multiplicative linear correction and seamless stitching methods tended to score more highly on the subjective survey; however, for some data sets, this led to the introduction of new artifacts. In contrast, simple averaging and interpolation methods scored subjectively poorly on the biological data set, but more highly on the microarray data sets. We discuss and explore these findings in depth and present general recommendations given our findings to conclude the work. American Chemical Society 2023-11-14 /pmc/articles/PMC10688221/ /pubmed/37963228 http://dx.doi.org/10.1021/acs.analchem.3c03887 Text en © 2023 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by-nc-nd/4.0/Permits non-commercial access and re-use, provided that author attribution and integrity are maintained; but does not permit creation of adaptations or other derivative works (https://creativecommons.org/licenses/by-nc-nd/4.0/).
spellingShingle Kandanaarachchi, Sevvandi
Gardner, Wil
Alexander, David L. J.
Muir, Benjamin W.
Chouinard, Philippe A.
Crewther, Sheila G.
Scurr, David J.
Halliday, Mark
Pigram, Paul J.
Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images
title Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images
title_full Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images
title_fullStr Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images
title_full_unstemmed Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images
title_short Comparison of Tiling Artifact Removal Methods in Secondary Ion Mass Spectrometry Images
title_sort comparison of tiling artifact removal methods in secondary ion mass spectrometry images
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10688221/
https://www.ncbi.nlm.nih.gov/pubmed/37963228
http://dx.doi.org/10.1021/acs.analchem.3c03887
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