Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask

We have demonstrated lithography-free, simple, and large area fabrication method for subwavelength antireflection structures (SAS) to achieve low reflectance of silicon (Si) surface. Thin film of Pt/Pd alloy on a Si substrate is melted and agglomerated into hemispheric nanodots by thermal dewetting...

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Detalles Bibliográficos
Autores principales: Lee, Youngjae, Koh, Kisik, Na, Hyungjoo, Kim, Kwanoh, Kang, Jeong-Jin, Kim, Jongbaeg
Formato: Texto
Lenguaje:English
Publicado: Springer 2009
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893707/
https://www.ncbi.nlm.nih.gov/pubmed/20596495
http://dx.doi.org/10.1007/s11671-009-9255-4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893707/
https://www.ncbi.nlm.nih.gov/pubmed/20596495
http://dx.doi.org/10.1007/s11671-009-9255-4

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