Facile Fabrication of Ultrafine Hollow Silica and Magnetic Hollow Silica Nanoparticles by a Dual-Templating Approach

The development of synthetic process for hollow silica materials is an issue of considerable topical interest. While a number of chemical routes are available and are extensively used, the diameter of hollow silica often large than 50 nm. Here, we report on a facial route to synthesis ultrafine holl...

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Detalles Bibliográficos
Autores principales: Wu, Wei, Xiao, Xiangheng, Zhang, Shaofeng, Fan, Lixia, Peng, Tangchao, Ren, Feng, Jiang, Changzhong
Formato: Texto
Lenguaje:English
Publicado: Springer 2009
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893720/
https://www.ncbi.nlm.nih.gov/pubmed/20651920
http://dx.doi.org/10.1007/s11671-009-9452-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893720/
https://www.ncbi.nlm.nih.gov/pubmed/20651920
http://dx.doi.org/10.1007/s11671-009-9452-1

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