Rolled-Up Nanotech: Illumination-Controlled Hydrofluoric Acid Etching of AlAs Sacrificial Layers

The effect of illumination on the hydrofluoric acid etching of AlAs sacrificial layers with systematically varied thicknesses in order to release and roll up InGaAs/GaAs bilayers was studied. For thicknesses of AlAs below 10 nm, there were two etching regimes for the area under illumination: one at...

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Detalles Bibliográficos
Autores principales: Costescu, Ruxandra M, Deneke, Christoph, Thurmer, Dominic J, Schmidt, Oliver G
Formato: Texto
Lenguaje:English
Publicado: Springer 2009
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893847/
https://www.ncbi.nlm.nih.gov/pubmed/20652125
http://dx.doi.org/10.1007/s11671-009-9421-8

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893847/
https://www.ncbi.nlm.nih.gov/pubmed/20652125
http://dx.doi.org/10.1007/s11671-009-9421-8

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