An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands throu...

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Detalles Bibliográficos
Autores principales: Park, Seong-Je, Lee, Soon-Won, Lee, Ki-Joong, Lee, Ji-Hye, Kim, Ki-Don, Jeong, Jun-Ho, Choi, Jun-Hyuk
Formato: Texto
Lenguaje:English
Publicado: Springer 2010
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2956053/
https://www.ncbi.nlm.nih.gov/pubmed/21076677
http://dx.doi.org/10.1007/s11671-010-9678-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2956053/
https://www.ncbi.nlm.nih.gov/pubmed/21076677
http://dx.doi.org/10.1007/s11671-010-9678-y

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