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Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography
In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon substrate. To fabricate nano-patterned ZnO nanorods, patterning of an n-octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) on SiO(2 )substrate was prepared by the...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2011
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211210/ https://www.ncbi.nlm.nih.gov/pubmed/21711665 http://dx.doi.org/10.1186/1556-276X-6-159 |