Ordered GeSi nanorings grown on patterned Si (001) substrates

An easy approach to fabricate ordered pattern using nanosphere lithography and reactive iron etching technology was demonstrated. Long-range ordered GeSi nanorings with 430 nm period were grown on patterned Si (001) substrates by molecular beam epitaxy. The size and shape of rings were closely assoc...

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Detalles Bibliográficos
Autores principales: Ma, Yingjie, Cui, Jian, Fan, Yongliang, Zhong, Zhenyang, Jiang, Zuimin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211261/
https://www.ncbi.nlm.nih.gov/pubmed/21711732
http://dx.doi.org/10.1186/1556-276X-6-205

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211261/
https://www.ncbi.nlm.nih.gov/pubmed/21711732
http://dx.doi.org/10.1186/1556-276X-6-205

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