Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering

In this article, we present an investigation of (Ge + SiO(2))/SiO(2 )multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transmission electron microscopy, grazing incidence small angles X-ray scattering, Ru...

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Detalles Bibliográficos
Autores principales: Pinto, Sara RC, Rolo, Anabela G, Buljan, Maja, Chahboun, Adil, Bernstorff, Sigrid, Barradas, Nuno P, Alves, Eduardo, Kashtiban, Reza J, Bangert, Ursel, Gomes, Maria JM
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211430/
https://www.ncbi.nlm.nih.gov/pubmed/21711858
http://dx.doi.org/10.1186/1556-276X-6-341

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211430/
https://www.ncbi.nlm.nih.gov/pubmed/21711858
http://dx.doi.org/10.1186/1556-276X-6-341

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