Freestanding HfO(2 )grating fabricated by fast atom beam etching

We report here the fabrication of freestanding HfO(2 )grating by combining fast atom beam etching (FAB) of HfO(2 )film with dry etching of silicon substrate. HfO(2 )film is deposited onto silicon substrate by electron beam evaporator. The grating patterns are then defined by electron beam lithograph...

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Detalles Bibliográficos
Autores principales: Wang, Yongjin, Wu, Tong, Kanamori, Yoshiaki, Hane, Kazuhiro
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211457/
https://www.ncbi.nlm.nih.gov/pubmed/21711898
http://dx.doi.org/10.1186/1556-276X-6-367

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211457/
https://www.ncbi.nlm.nih.gov/pubmed/21711898
http://dx.doi.org/10.1186/1556-276X-6-367

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