Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si

Ion beam sputtering of ultrathin film Au coatings used as a physical catalyst for self-organization of Si nanostructures has been achieved by tuning the incident particle energy. This approach holds promise as a scalable nanomanufacturing parallel processing alternative to candidate nanolithography...

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Detalles Bibliográficos
Autores principales: El-Atwani, Osman, Ortoleva, Sami, Cimaroli, Alex, Allain, Jean Paul
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211498/
https://www.ncbi.nlm.nih.gov/pubmed/21711934
http://dx.doi.org/10.1186/1556-276X-6-403

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211498/
https://www.ncbi.nlm.nih.gov/pubmed/21711934
http://dx.doi.org/10.1186/1556-276X-6-403

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