Iridium wire grid polarizer fabricated using atomic layer deposition

In this work, an effective multistep process toward fabrication of an iridium wire grid polarizer for UV applications involving a frequency doubling process based on ultrafast electron beam lithography and atomic layer deposition is presented. The choice of iridium as grating material is based on it...

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Detalles Bibliográficos
Autores principales: Weber, Thomas, Käsebier, Thomas, Szeghalmi, Adriana, Knez, Mato, Kley, Ernst-Bernhard, Tünnermann, Andreas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3213227/
https://www.ncbi.nlm.nih.gov/pubmed/22023700
http://dx.doi.org/10.1186/1556-276X-6-558

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3213227/
https://www.ncbi.nlm.nih.gov/pubmed/22023700
http://dx.doi.org/10.1186/1556-276X-6-558

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