Enhanced photo-sensitivity through an increased light-trapping on Si by surface nano-structuring using MWCNT etch mask

We demonstrate an enhanced photo-sensitivity (PS) through an increased light-trapping using surface nano-structuring technique by inductively coupled plasma (ICP) etching on multi-walled carbon nanotube (MWCNT) etch masked Si with hexamethyl-disilazane (HMDS) dispersion. In order for a systematic co...

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Detalles Bibliográficos
Autores principales: Hwang, Min-Young, Kim, Hyungsuk, Kim, Eun-Soo, Lee, Jihoon, Koo, Sang-Mo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3215771/
https://www.ncbi.nlm.nih.gov/pubmed/22040026
http://dx.doi.org/10.1186/1556-276X-6-573

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3215771/
https://www.ncbi.nlm.nih.gov/pubmed/22040026
http://dx.doi.org/10.1186/1556-276X-6-573

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