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A Tunable Strain Sensor Using Nanogranular Metals

This paper introduces a new methodology for the fabrication of strain-sensor elements for MEMS and NEMS applications based on the tunneling effect in nano-granular metals. The strain-sensor elements are prepared by the maskless lithography technique of focused electron-beam-induced deposition (FEBID...

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Detalles Bibliográficos
Autores principales: Schwalb, Christian H., Grimm, Christina, Baranowski, Markus, Sachser, Roland, Porrati, Fabrizio, Reith, Heiko, Das, Pintu, Müller, Jens, Völklein, Friedemann, Kaya, Alexander, Huth, Michael
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Molecular Diversity Preservation International (MDPI) 2010
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3231023/
https://www.ncbi.nlm.nih.gov/pubmed/22163443
http://dx.doi.org/10.3390/s101109847
Descripción
Sumario:This paper introduces a new methodology for the fabrication of strain-sensor elements for MEMS and NEMS applications based on the tunneling effect in nano-granular metals. The strain-sensor elements are prepared by the maskless lithography technique of focused electron-beam-induced deposition (FEBID) employing the precursor trimethylmethylcyclopentadienyl platinum [MeCpPt(Me)(3)]. We use a cantilever-based deflection technique to determine the sensitivity (gauge factor) of the sensor element. We find that its sensitivity depends on the electrical conductivity and can be continuously tuned, either by the thickness of the deposit or by electron-beam irradiation leading to a distinct maximum in the sensitivity. This maximum finds a theoretical rationale in recent advances in the understanding of electronic charge transport in nano-granular metals.