Magnetically interacting low dimensional Ni-nanostructures within porous silicon

Electrodeposition of ferromagnetic metals, a common method to fabricate magnetic nanostructures, is used for the incorporation of Ni structures into the pores of porous silicon templates. The porous silicon is fabricated in various morphologies with average pore-diameters between 40 and 95 nm and co...

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Detalles Bibliográficos
Autores principales: Rumpf, K., Granitzer, P., Hilscher, G., Albu, M., Poelt, P.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2012
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3242907/
https://www.ncbi.nlm.nih.gov/pubmed/22308049
http://dx.doi.org/10.1016/j.mee.2011.05.016

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3242907/
https://www.ncbi.nlm.nih.gov/pubmed/22308049
http://dx.doi.org/10.1016/j.mee.2011.05.016

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