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Nanoscale waveguiding methods
While 32 nm lithography technology is on the horizon for integrated circuit (IC) fabrication, matching the pace for miniaturization with optics has been hampered by the diffraction limit. However, development of nanoscale components and guiding methods is burgeoning through advances in fabrication t...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2007
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3246340/ https://www.ncbi.nlm.nih.gov/pubmed/21806847 http://dx.doi.org/10.1007/s11671-007-9056-6 |