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Surface Morphology Evolution of GaAs by Low Energy Ion Sputtering

Low energy Ar(+)ion sputtering, typically below 1,200 eV, of GaAs at normal beam incident angle is investigated. Surface morphology development with respect to varying energy is analyzed and discussed. Dot-like patterns in the nanometer scale are obtained above 600 eV. As the energy approaches upper...

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Detalles Bibliográficos
Autores principales: Wang, Y, Yoon, SF, Ngo, CY, Ahn, J
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2007
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3246606/
http://dx.doi.org/10.1007/s11671-007-9090-4