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Surface Morphology Evolution of GaAs by Low Energy Ion Sputtering
Low energy Ar(+)ion sputtering, typically below 1,200 eV, of GaAs at normal beam incident angle is investigated. Surface morphology development with respect to varying energy is analyzed and discussed. Dot-like patterns in the nanometer scale are obtained above 600 eV. As the energy approaches upper...
Autores principales: | Wang, Y, Yoon, SF, Ngo, CY, Ahn, J |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer
2007
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3246606/ http://dx.doi.org/10.1007/s11671-007-9090-4 |
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