Structure and electrical properties of sputtered TiO(2)/ZrO(2 )bilayer composite dielectrics upon annealing in nitrogen

The high-k dielectric TiO(2)/ZrO(2 )bilayer composite film was prepared on a Si substrate by radio frequency magnetron sputtering and post annealing in N(2 )at various temperatures in the range of 573 K to 973 K. Transmission electron microscopy observation revealed that the bilayer film fully mixed...

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Detalles Bibliográficos
Autores principales: Dong, Ming, Wang, Hao, Ye, Cong, Shen, Liangping, Wang, Yi, Zhang, Jieqiong, Ye, Yun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Original Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3268094/
https://www.ncbi.nlm.nih.gov/pubmed/22221384
http://dx.doi.org/10.1186/1556-276X-7-31

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3268094/
https://www.ncbi.nlm.nih.gov/pubmed/22221384
http://dx.doi.org/10.1186/1556-276X-7-31

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