Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system

We have investigated the characteristics of a silicon oxynitride/silver/silicon oxynitride [SiON/Ag/SiON] multilayer passivation grown using a specially designed roll-to-roll [R2R] sputtering system on a flexible polyethersulfone substrate. Optical, structural, and surface properties of the R2R grow...

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Detalles Bibliográficos
Autores principales: Kim, Han-Ki, Cho, Chung-Ki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3275511/
https://www.ncbi.nlm.nih.gov/pubmed/22221400
http://dx.doi.org/10.1186/1556-276X-7-69
_version_ 1782223225916227584
author Kim, Han-Ki
Cho, Chung-Ki
author_facet Kim, Han-Ki
Cho, Chung-Ki
author_sort Kim, Han-Ki
collection PubMed
description We have investigated the characteristics of a silicon oxynitride/silver/silicon oxynitride [SiON/Ag/SiON] multilayer passivation grown using a specially designed roll-to-roll [R2R] sputtering system on a flexible polyethersulfone substrate. Optical, structural, and surface properties of the R2R grown SiON/Ag/SiON multilayer were investigated as a function of the SiON thickness at a constant Ag thickness of 12 nm. The flexible SiON/Ag/SiON multilayer has a high optical transmittance of 87.7% at optimized conditions due to the antireflection and surface plasmon effects in the oxide-metal-oxide structure. The water vapor transmission rate of the SiON/Ag/SiON multilayer is 0.031 g/m(2 )day at an optimized SiON thickness of 110 nm. This indicates that R2R grown SiON/Ag/SiON is a promising thin-film passivation for flexible organic light-emitting diodes and flexible organic photovoltaics due to its simple and low-temperature process.
format Online
Article
Text
id pubmed-3275511
institution National Center for Biotechnology Information
language English
publishDate 2012
publisher Springer
record_format MEDLINE/PubMed
spelling pubmed-32755112012-02-09 Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system Kim, Han-Ki Cho, Chung-Ki Nanoscale Res Lett Nano Express We have investigated the characteristics of a silicon oxynitride/silver/silicon oxynitride [SiON/Ag/SiON] multilayer passivation grown using a specially designed roll-to-roll [R2R] sputtering system on a flexible polyethersulfone substrate. Optical, structural, and surface properties of the R2R grown SiON/Ag/SiON multilayer were investigated as a function of the SiON thickness at a constant Ag thickness of 12 nm. The flexible SiON/Ag/SiON multilayer has a high optical transmittance of 87.7% at optimized conditions due to the antireflection and surface plasmon effects in the oxide-metal-oxide structure. The water vapor transmission rate of the SiON/Ag/SiON multilayer is 0.031 g/m(2 )day at an optimized SiON thickness of 110 nm. This indicates that R2R grown SiON/Ag/SiON is a promising thin-film passivation for flexible organic light-emitting diodes and flexible organic photovoltaics due to its simple and low-temperature process. Springer 2012-01-05 /pmc/articles/PMC3275511/ /pubmed/22221400 http://dx.doi.org/10.1186/1556-276X-7-69 Text en Copyright ©2012 Kim and Cho; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Kim, Han-Ki
Cho, Chung-Ki
Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
title Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
title_full Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
title_fullStr Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
title_full_unstemmed Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
title_short Transparent SiON/Ag/SiON multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
title_sort transparent sion/ag/sion multilayer passivation grown on a flexible polyethersulfone substrate using a continuous roll-to-roll sputtering system
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3275511/
https://www.ncbi.nlm.nih.gov/pubmed/22221400
http://dx.doi.org/10.1186/1556-276X-7-69
work_keys_str_mv AT kimhanki transparentsionagsionmultilayerpassivationgrownonaflexiblepolyethersulfonesubstrateusingacontinuousrolltorollsputteringsystem
AT chochungki transparentsionagsionmultilayerpassivationgrownonaflexiblepolyethersulfonesubstrateusingacontinuousrolltorollsputteringsystem

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