Cargando…
SiC formation for a solar cell passivation layer using an RF magnetron co-sputtering system
In this paper, we describe a method of amorphous silicon carbide film formation for a solar cell passivation layer. The film was deposited on p-type silicon (100) and glass substrates by an RF magnetron co-sputtering system using a Si target and a C target at a room-temperature condition. Several di...
| Autores principales: | , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2012
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3276418/ https://www.ncbi.nlm.nih.gov/pubmed/22221730 http://dx.doi.org/10.1186/1556-276X-7-22 |