Fabrication mechanism of friction-induced selective etching on Si(100) surface

As a maskless nanofabrication technique, friction-induced selective etching can easily produce nanopatterns on a Si(100) surface. Experimental results indicated that the height of the nanopatterns increased with the KOH etching time, while their width increased with the scratching load. It has also...

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Detalles Bibliográficos
Autores principales: Guo, Jian, Song, Chenfei, Li, Xiaoying, Yu, Bingjun, Dong, Hanshan, Qian, Linmao, Zhou, Zhongrong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3311066/
https://www.ncbi.nlm.nih.gov/pubmed/22356699
http://dx.doi.org/10.1186/1556-276X-7-152

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3311066/
https://www.ncbi.nlm.nih.gov/pubmed/22356699
http://dx.doi.org/10.1186/1556-276X-7-152

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