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Immobilization of enzyme and antibody on ALD-HfO(2)-EIS structure by NH(3 )plasma treatment
Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH(3 )plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobiliza...
Autores principales: | , , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer
2012
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3329401/ https://www.ncbi.nlm.nih.gov/pubmed/22401350 http://dx.doi.org/10.1186/1556-276X-7-179 |