High-Throughput Top-Down Fabrication of Uniform Magnetic Particles

Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)–10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stenc...

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Detalles Bibliográficos
Autores principales: Litvinov, Julia, Nasrullah, Azeem, Sherlock, Timothy, Wang, Yi-Ju, Ruchhoeft, Paul, Willson, Richard C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2012
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3365077/
https://www.ncbi.nlm.nih.gov/pubmed/22693574
http://dx.doi.org/10.1371/journal.pone.0037440

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3365077/
https://www.ncbi.nlm.nih.gov/pubmed/22693574
http://dx.doi.org/10.1371/journal.pone.0037440

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