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High-Throughput Top-Down Fabrication of Uniform Magnetic Particles

Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)–10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stenc...

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Autores principales: Litvinov, Julia, Nasrullah, Azeem, Sherlock, Timothy, Wang, Yi-Ju, Ruchhoeft, Paul, Willson, Richard C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2012
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3365077/
https://www.ncbi.nlm.nih.gov/pubmed/22693574
http://dx.doi.org/10.1371/journal.pone.0037440
_version_ 1782234640199712768
author Litvinov, Julia
Nasrullah, Azeem
Sherlock, Timothy
Wang, Yi-Ju
Ruchhoeft, Paul
Willson, Richard C.
author_facet Litvinov, Julia
Nasrullah, Azeem
Sherlock, Timothy
Wang, Yi-Ju
Ruchhoeft, Paul
Willson, Richard C.
author_sort Litvinov, Julia
collection PubMed
description Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)–10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stencil mask containing an array of circular openings is illuminated by a broad beam of energetic (5–8 keV) ions, and is used to write arrays of specific repetitive patterns. A commercial 5-micrometer metal mesh was used as a stencil mask; the mesh size was adjusted by shrinking the stencil openings using conformal sputter-deposition of copper. Thermal evaporation from multiple sources was utilized to form magnetic particles of varied size and thickness, including alternating layers of gold and permalloy. Evaporation of permalloy layers in the presence of a magnetic field allowed creation of particles with uniform magnetic properties and pre-determined magnetization direction. The magnetic properties of the resulting particles were characterized by Vibrating Sample Magnetometry. Since the orientation of the particles on the substrate before release into suspension is known, the orientation-dependent magnetic properties of the particles could be determined.
format Online
Article
Text
id pubmed-3365077
institution National Center for Biotechnology Information
language English
publishDate 2012
publisher Public Library of Science
record_format MEDLINE/PubMed
spelling pubmed-33650772012-06-12 High-Throughput Top-Down Fabrication of Uniform Magnetic Particles Litvinov, Julia Nasrullah, Azeem Sherlock, Timothy Wang, Yi-Ju Ruchhoeft, Paul Willson, Richard C. PLoS One Research Article Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)–10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stencil mask containing an array of circular openings is illuminated by a broad beam of energetic (5–8 keV) ions, and is used to write arrays of specific repetitive patterns. A commercial 5-micrometer metal mesh was used as a stencil mask; the mesh size was adjusted by shrinking the stencil openings using conformal sputter-deposition of copper. Thermal evaporation from multiple sources was utilized to form magnetic particles of varied size and thickness, including alternating layers of gold and permalloy. Evaporation of permalloy layers in the presence of a magnetic field allowed creation of particles with uniform magnetic properties and pre-determined magnetization direction. The magnetic properties of the resulting particles were characterized by Vibrating Sample Magnetometry. Since the orientation of the particles on the substrate before release into suspension is known, the orientation-dependent magnetic properties of the particles could be determined. Public Library of Science 2012-05-31 /pmc/articles/PMC3365077/ /pubmed/22693574 http://dx.doi.org/10.1371/journal.pone.0037440 Text en Litvinov et al. http://creativecommons.org/licenses/by/4.0/ This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are properly credited.
spellingShingle Research Article
Litvinov, Julia
Nasrullah, Azeem
Sherlock, Timothy
Wang, Yi-Ju
Ruchhoeft, Paul
Willson, Richard C.
High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
title High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
title_full High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
title_fullStr High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
title_full_unstemmed High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
title_short High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
title_sort high-throughput top-down fabrication of uniform magnetic particles
topic Research Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3365077/
https://www.ncbi.nlm.nih.gov/pubmed/22693574
http://dx.doi.org/10.1371/journal.pone.0037440
work_keys_str_mv AT litvinovjulia highthroughputtopdownfabricationofuniformmagneticparticles
AT nasrullahazeem highthroughputtopdownfabricationofuniformmagneticparticles
AT sherlocktimothy highthroughputtopdownfabricationofuniformmagneticparticles
AT wangyiju highthroughputtopdownfabricationofuniformmagneticparticles
AT ruchhoeftpaul highthroughputtopdownfabricationofuniformmagneticparticles
AT willsonrichardc highthroughputtopdownfabricationofuniformmagneticparticles