Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method

A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-bas...

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Detalles Bibliográficos
Autores principales: Dang, Zhiya, Breese, Mark BH, Recio-Sánchez, Gonzalo, Azimi, Sara, Song, Jiao, Liang, Haidong, Banas, Agnieszka, Torres-Costa, Vicente, Martín-Palma, Raúl José
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3420235/
https://www.ncbi.nlm.nih.gov/pubmed/22824206
http://dx.doi.org/10.1186/1556-276X-7-416

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3420235/
https://www.ncbi.nlm.nih.gov/pubmed/22824206
http://dx.doi.org/10.1186/1556-276X-7-416

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