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Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method
A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-bas...
| Autores principales: | , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2012
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3420235/ https://www.ncbi.nlm.nih.gov/pubmed/22824206 http://dx.doi.org/10.1186/1556-276X-7-416 |