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Purification of silicon powder by the formation of thin porous layer followed byphoto-thermal annealing
Porous silicon has been prepared using a vapor-etching based technique on a commercial silicon powder. Strong visible emission was observed in all samples. Obtained silicon powder with a thin porous layer at the surface was subjected to a photo-thermal annealing at different temperatures under oxyge...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2012
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3475061/ https://www.ncbi.nlm.nih.gov/pubmed/22873706 http://dx.doi.org/10.1186/1556-276X-7-444 |