A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxane

We synthesized a series of epoxysiloxane oligomers with controllable viscosity and polarity and developed upon them a thermal-curable nanoimprint resist that was cross-linked in air at 110°C within 30 s if preexposed to UV light. The oligomers were designed and synthesized via hydrosilylation of 4-v...

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Detalles Bibliográficos
Autores principales: Zhang, Jizong, Hu, Xin, Zhang, Jian, Cui, Yushang, Yuan, Changsheng, Ge, Haixiong, Chen, Yanfeng, Wu, Wei, Xia, Qiangfei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3496635/
https://www.ncbi.nlm.nih.gov/pubmed/22775987
http://dx.doi.org/10.1186/1556-276X-7-380

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3496635/
https://www.ncbi.nlm.nih.gov/pubmed/22775987
http://dx.doi.org/10.1186/1556-276X-7-380

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