Multilayer porous silicon diffraction gratings operating in the infrared

Transmission diffraction gratings operating at 1,565 nm based on multilayer porous silicon films are modeled, fabricated, and tested. Features down to 2 μm have been patterned into submicron-thick mesoporous films using standard photolithographic and dry etching techniques. After patterning of the t...

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Detalles Bibliográficos
Autores principales: Lai, Meifang, Sridharan, Gayathri M, Parish, Giacinta, Bhattacharya, Shanti, Keating, Adrian
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3519758/
https://www.ncbi.nlm.nih.gov/pubmed/23176591
http://dx.doi.org/10.1186/1556-276X-7-645

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3519758/
https://www.ncbi.nlm.nih.gov/pubmed/23176591
http://dx.doi.org/10.1186/1556-276X-7-645

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