In situ-grown hexagonal silicon nanocrystals in silicon carbide-based films

Silicon nanocrystals (Si-NCs) were grown in situ in carbide-based film using a plasma-enhanced chemical vapor deposition method. High-resolution transmission electron microscopy indicates that these nanocrystallites were embedded in an amorphous silicon carbide-based matrix. Electron diffraction pat...

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Detalles Bibliográficos
Autores principales: Kim, Tae-Youb, Huh, Chul, Park, Nae-Man, Choi, Cheol-Jong, Suemitsu, Maki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3534491/
https://www.ncbi.nlm.nih.gov/pubmed/23171576
http://dx.doi.org/10.1186/1556-276X-7-634

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3534491/
https://www.ncbi.nlm.nih.gov/pubmed/23171576
http://dx.doi.org/10.1186/1556-276X-7-634

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