A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface

Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O(2) re...

Descripción completa

Detalles Bibliográficos
Autores principales: Kim, Jung Suk, Jeong, Hyun Woo, Lee, Wonbae, Park, Bo Gi, Kim, Beop Min, Lee, Kyu Back
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3552822/
https://www.ncbi.nlm.nih.gov/pubmed/22853428
http://dx.doi.org/10.1186/1556-276X-7-430

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3552822/
https://www.ncbi.nlm.nih.gov/pubmed/22853428
http://dx.doi.org/10.1186/1556-276X-7-430

Ejemplares similares