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A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface
Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O(2) re...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2012
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3552822/ https://www.ncbi.nlm.nih.gov/pubmed/22853428 http://dx.doi.org/10.1186/1556-276X-7-430 |