Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask

ABSTRACT: We report on Si nanopatterning through an on-chip self-assembled porous anodic alumina (PAA) masking layer using reactive ion etching based on fluorine chemistry. Three different gases/gas mixtures were investigated: pure SF(6), SF(6)/O(2), and SF(6)/CHF(3). For the first time, a systemati...

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Detalles Bibliográficos
Autores principales: Gianneta, Violetta, Olziersky, Antonis, Nassiopoulou, Androula G
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3605172/
https://www.ncbi.nlm.nih.gov/pubmed/23402551
http://dx.doi.org/10.1186/1556-276X-8-71

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3605172/
https://www.ncbi.nlm.nih.gov/pubmed/23402551
http://dx.doi.org/10.1186/1556-276X-8-71

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