Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching

We demonstrated a novel, simple, and low-cost method to fabricate silicon nanowire (SiNW) arrays and silicon nanohole (SiNH) arrays based on thin silver (Ag) film dewetting process combined with metal-assisted chemical etching. Ag mesh with holes and semispherical Ag nanoparticles can be prepared by...

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Detalles Bibliográficos
Autores principales: Liu, Ruiyuan, Zhang, Fute, Con, Celal, Cui, Bo, Sun, Baoquan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3645966/
https://www.ncbi.nlm.nih.gov/pubmed/23557325
http://dx.doi.org/10.1186/1556-276X-8-155

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3645966/
https://www.ncbi.nlm.nih.gov/pubmed/23557325
http://dx.doi.org/10.1186/1556-276X-8-155

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