Low-temperature synthesis of graphene on Cu using plasma-assisted thermal chemical vapor deposition

Plasma-assisted thermal chemical vapor deposition (CVD) was carried out to synthesize high-quality graphene film at a low temperature of 600°C. Monolayer graphene films were thus synthesized on Cu foil using various ratios of hydrogen and methane in a gaseous mixture. The in situ plasma emission spe...

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Detalles Bibliográficos
Autores principales: Chan, Shih-Hao, Chen, Sheng-Hui, Lin, Wei-Ting, Li, Meng-Chi, Lin, Yung-Chang, Kuo, Chien-Cheng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3682863/
https://www.ncbi.nlm.nih.gov/pubmed/23758668
http://dx.doi.org/10.1186/1556-276X-8-285

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3682863/
https://www.ncbi.nlm.nih.gov/pubmed/23758668
http://dx.doi.org/10.1186/1556-276X-8-285

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