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Metallic behaviour in SOI quantum wells with strong intervalley scattering
The fundamental properties of valleys are recently attracting growing attention due to electrons in new and topical materials possessing this degree-of-freedom and recent proposals for valleytronics devices. In silicon MOSFETs, the interest has a longer history since the valley degree of freedom had...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2013
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3684805/ https://www.ncbi.nlm.nih.gov/pubmed/23774638 http://dx.doi.org/10.1038/srep02011 |
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author | Renard, V. T. Duchemin, I. Niida, Y. Fujiwara, A. Hirayama, Y. Takashina, K. |
author_facet | Renard, V. T. Duchemin, I. Niida, Y. Fujiwara, A. Hirayama, Y. Takashina, K. |
author_sort | Renard, V. T. |
collection | PubMed |
description | The fundamental properties of valleys are recently attracting growing attention due to electrons in new and topical materials possessing this degree-of-freedom and recent proposals for valleytronics devices. In silicon MOSFETs, the interest has a longer history since the valley degree of freedom had been identified as a key parameter in the observation of the controversial “metallic behaviour” in two dimensions. However, while it has been recently demonstrated that lifting valley degeneracy can destroy the metallic behaviour, little is known about the role of intervalley scattering. Here, we show that the metallic behaviour can be observed in the presence of strong intervalley scattering in silicon on insulator (SOI) quantum wells. Analysis of the conductivity in terms of quantum corrections reveals that interactions are much stronger in SOI than in conventional MOSFETs, leading to the metallic behaviour despite the strong intervalley scattering. |
format | Online Article Text |
id | pubmed-3684805 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2013 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-36848052013-06-24 Metallic behaviour in SOI quantum wells with strong intervalley scattering Renard, V. T. Duchemin, I. Niida, Y. Fujiwara, A. Hirayama, Y. Takashina, K. Sci Rep Article The fundamental properties of valleys are recently attracting growing attention due to electrons in new and topical materials possessing this degree-of-freedom and recent proposals for valleytronics devices. In silicon MOSFETs, the interest has a longer history since the valley degree of freedom had been identified as a key parameter in the observation of the controversial “metallic behaviour” in two dimensions. However, while it has been recently demonstrated that lifting valley degeneracy can destroy the metallic behaviour, little is known about the role of intervalley scattering. Here, we show that the metallic behaviour can be observed in the presence of strong intervalley scattering in silicon on insulator (SOI) quantum wells. Analysis of the conductivity in terms of quantum corrections reveals that interactions are much stronger in SOI than in conventional MOSFETs, leading to the metallic behaviour despite the strong intervalley scattering. Nature Publishing Group 2013-06-18 /pmc/articles/PMC3684805/ /pubmed/23774638 http://dx.doi.org/10.1038/srep02011 Text en Copyright © 2013, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-nd/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-nd/3.0/ |
spellingShingle | Article Renard, V. T. Duchemin, I. Niida, Y. Fujiwara, A. Hirayama, Y. Takashina, K. Metallic behaviour in SOI quantum wells with strong intervalley scattering |
title | Metallic behaviour in SOI quantum wells with strong intervalley scattering |
title_full | Metallic behaviour in SOI quantum wells with strong intervalley scattering |
title_fullStr | Metallic behaviour in SOI quantum wells with strong intervalley scattering |
title_full_unstemmed | Metallic behaviour in SOI quantum wells with strong intervalley scattering |
title_short | Metallic behaviour in SOI quantum wells with strong intervalley scattering |
title_sort | metallic behaviour in soi quantum wells with strong intervalley scattering |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3684805/ https://www.ncbi.nlm.nih.gov/pubmed/23774638 http://dx.doi.org/10.1038/srep02011 |
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