Fabrication of Dense Non-Circular Nanomagnetic Device Arrays Using Self-Limiting Low-Energy Glow-Discharge Processing

We describe a low-energy glow-discharge process using reactive ion etching system that enables non-circular device patterns, such as squares or hexagons, to be formed from a precursor array of uniform circular openings in polymethyl methacrylate, PMMA, defined by electron beam lithography. This tech...

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Detalles Bibliográficos
Autores principales: Zheng, Zhen, Chang, Long, Nekrashevich, Ivan, Ruchhoeft, Paul, Khizroev, Sakhrat, Litvinov, Dmitri
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2013
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3743781/
https://www.ncbi.nlm.nih.gov/pubmed/23967340
http://dx.doi.org/10.1371/journal.pone.0073083

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3743781/
https://www.ncbi.nlm.nih.gov/pubmed/23967340
http://dx.doi.org/10.1371/journal.pone.0073083

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