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Fabrication of Dense Non-Circular Nanomagnetic Device Arrays Using Self-Limiting Low-Energy Glow-Discharge Processing
We describe a low-energy glow-discharge process using reactive ion etching system that enables non-circular device patterns, such as squares or hexagons, to be formed from a precursor array of uniform circular openings in polymethyl methacrylate, PMMA, defined by electron beam lithography. This tech...
Autores principales: | Zheng, Zhen, Chang, Long, Nekrashevich, Ivan, Ruchhoeft, Paul, Khizroev, Sakhrat, Litvinov, Dmitri |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Public Library of Science
2013
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3743781/ https://www.ncbi.nlm.nih.gov/pubmed/23967340 http://dx.doi.org/10.1371/journal.pone.0073083 |
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