High-Throughput Nanofabrication of Infra-red and Chiral Metamaterials using Nanospherical-Lens Lithography

Various infra-red and planar chiral metamaterials were fabricated using the modified Nanospherical-Lens Lithography. By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spher...

Descripción completa

Detalles Bibliográficos
Autores principales: Chang, Yun-Chorng, Lu, Sih-Chen, Chung, Hsin-Chan, Wang, Shih-Ming, Tsai, Tzung-Da, Guo, Tzung-Fang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2013
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3842549/
https://www.ncbi.nlm.nih.gov/pubmed/24284941
http://dx.doi.org/10.1038/srep03339

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3842549/
https://www.ncbi.nlm.nih.gov/pubmed/24284941
http://dx.doi.org/10.1038/srep03339

Ejemplares similares