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Interface traps and quantum size effects on the retention time in nanoscale memory devices

Based on the analysis of Poisson equation, an analytical surface potential model including interface charge density for nanocrystalline (NC) germanium (Ge) memory devices with p-type silicon substrate has been proposed. Thus, the effects of P(b) defects at Si(110)/SiO(2), Si(111)/SiO(2), and Si(100)...

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Detalles Bibliográficos
Autor principal: Mao, Ling-Feng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3847579/
https://www.ncbi.nlm.nih.gov/pubmed/23984827
http://dx.doi.org/10.1186/1556-276X-8-369
Descripción
Sumario:Based on the analysis of Poisson equation, an analytical surface potential model including interface charge density for nanocrystalline (NC) germanium (Ge) memory devices with p-type silicon substrate has been proposed. Thus, the effects of P(b) defects at Si(110)/SiO(2), Si(111)/SiO(2), and Si(100)/SiO(2) interfaces on the retention time have been calculated after quantum size effects have been considered. The results show that the interface trap density has a large effect on the electric field across the tunneling oxide layer and leakage current. This letter demonstrates that the retention time firstly increases with the decrease in diameter of NC Ge and then rapidly decreases with the diameter when it is a few nanometers. This implies that the interface defects, its energy distribution, and the NC size should be seriously considered in the aim to improve the retention time from different technological processes. The experimental data reported in the literature support the theoretical expectation.