Voltage distribution over capacitively coupled plasma electrode for atmospheric-pressure plasma generation

When capacitively coupled plasma (CCP) is used to generate large-area plasma, the standing wave effect becomes significant, which results in the hindering of the uniform plasma process such as in a plasma etcher or plasma chemical vapor deposition. In this study, the transmission line modeling metho...

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Detalles Bibliográficos
Autores principales: Shuto, Mitsutoshi, Tomino, Fukumi, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3848192/
https://www.ncbi.nlm.nih.gov/pubmed/23634893
http://dx.doi.org/10.1186/1556-276X-8-202

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3848192/
https://www.ncbi.nlm.nih.gov/pubmed/23634893
http://dx.doi.org/10.1186/1556-276X-8-202

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