Profile measurement of concave spherical mirror and a flat mirror using a high-speed nanoprofiler

Ultraprecise aspheric mirrors that offer nanofocusing and high coherence are indispensable for developing third-generation synchrotron radiation and X-ray free-electron laser sources. In industry, the extreme ultraviolet (wavelength: 13.5 nm) lithography used for high-accuracy aspheric mirrors is a...

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Detalles Bibliográficos
Autores principales: Usuki, Koji, Kitayama, Takao, Matsumura, Hiroki, Kojima, Takuya, Uchikoshi, Junichi, Higashi, Yasuo, Endo, Katsuyoshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3848380/
https://www.ncbi.nlm.nih.gov/pubmed/23680514
http://dx.doi.org/10.1186/1556-276X-8-231

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3848380/
https://www.ncbi.nlm.nih.gov/pubmed/23680514
http://dx.doi.org/10.1186/1556-276X-8-231

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