Cargando…
Profile measurement of concave spherical mirror and a flat mirror using a high-speed nanoprofiler
Ultraprecise aspheric mirrors that offer nanofocusing and high coherence are indispensable for developing third-generation synchrotron radiation and X-ray free-electron laser sources. In industry, the extreme ultraviolet (wavelength: 13.5 nm) lithography used for high-accuracy aspheric mirrors is a...
| Autores principales: | , , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2013
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3848380/ https://www.ncbi.nlm.nih.gov/pubmed/23680514 http://dx.doi.org/10.1186/1556-276X-8-231 |