Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition

Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed mor...

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Detalles Bibliográficos
Autores principales: Ha, Jun Mok, Yoo, Sung Ho, Cho, Jong Hoi, Cho, Yong Hoon, Cho, Sung Oh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3895744/
https://www.ncbi.nlm.nih.gov/pubmed/24397945
http://dx.doi.org/10.1186/1556-276X-9-9

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3895744/
https://www.ncbi.nlm.nih.gov/pubmed/24397945
http://dx.doi.org/10.1186/1556-276X-9-9

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