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Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition

Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed mor...

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Detalles Bibliográficos
Autores principales: Ha, Jun Mok, Yoo, Sung Ho, Cho, Jong Hoi, Cho, Yong Hoon, Cho, Sung Oh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2014
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3895744/
https://www.ncbi.nlm.nih.gov/pubmed/24397945
http://dx.doi.org/10.1186/1556-276X-9-9
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author Ha, Jun Mok
Yoo, Sung Ho
Cho, Jong Hoi
Cho, Yong Hoon
Cho, Sung Oh
author_facet Ha, Jun Mok
Yoo, Sung Ho
Cho, Jong Hoi
Cho, Yong Hoon
Cho, Sung Oh
author_sort Ha, Jun Mok
collection PubMed
description Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed morphologies of the nanostructures can be controlled by changing the etching condition. The nanostructured Si exhibited much more reduced reflectance than a flat Si surface: an average reflectance of the nanostructured Si was approximately 6.8% in visible light region and a slight high reflectance of approximately 17% in UV region. The reflectance was further reduced in both UV and visible light region through the deposition of a poly(dimethylsiloxane) layer with a rough surface on the Si nanostructure: the reflectance can be decreased down to 2.5%. The enhancement of the antireflection properties was analyzed with a finite difference time domain simulation method.
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spelling pubmed-38957442014-01-24 Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition Ha, Jun Mok Yoo, Sung Ho Cho, Jong Hoi Cho, Yong Hoon Cho, Sung Oh Nanoscale Res Lett Nano Express Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed morphologies of the nanostructures can be controlled by changing the etching condition. The nanostructured Si exhibited much more reduced reflectance than a flat Si surface: an average reflectance of the nanostructured Si was approximately 6.8% in visible light region and a slight high reflectance of approximately 17% in UV region. The reflectance was further reduced in both UV and visible light region through the deposition of a poly(dimethylsiloxane) layer with a rough surface on the Si nanostructure: the reflectance can be decreased down to 2.5%. The enhancement of the antireflection properties was analyzed with a finite difference time domain simulation method. Springer 2014-01-08 /pmc/articles/PMC3895744/ /pubmed/24397945 http://dx.doi.org/10.1186/1556-276X-9-9 Text en Copyright © 2014 Ha et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Ha, Jun Mok
Yoo, Sung Ho
Cho, Jong Hoi
Cho, Yong Hoon
Cho, Sung Oh
Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
title Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
title_full Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
title_fullStr Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
title_full_unstemmed Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
title_short Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
title_sort enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3895744/
https://www.ncbi.nlm.nih.gov/pubmed/24397945
http://dx.doi.org/10.1186/1556-276X-9-9
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