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Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition
Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed mor...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3895744/ https://www.ncbi.nlm.nih.gov/pubmed/24397945 http://dx.doi.org/10.1186/1556-276X-9-9 |